Surface Percolation and Growth. An alternative scheme for breaking the diffraction limit in optical patterning

  • D. Kunik
  • L. I. Pietrasanta
  • O. E. Martínez
Keywords: Lithography, Polymerization, Patterining

Abstract

A nanopatterning scheme is presented by which the structure height can be controlled in the tens of nanometers range and the lateral resolution is a factor at least three times better than the point spread function of the writing beam. The method relies on the initiation of the polymerization mediated by a very inefficient energy transfer from a fluorescent dye molecule after single photon absorption. The mechanism has the following distinctive steps: the dye adsorbs on the substrate surface with a higher concentration than in the bulk, upon illumination it triggers the polymerization, then isolated islands develop and merge into a uniform structure (percolation), which subsequently grows until the illumination is interrupted. This percolation mechanism has a threshold that introduces the needed nonlinearity for the fabrication of structures beyond the diffraction limit.

Received: 9 November 2009, Accepted: 29 December 2009; Edited by: J. J. Niemela; Reviewed by: H. Cabrera Morales, Inst. Venezolano Invest. Científicas, Venezuela; DOI: 10.4279/PIP.010008

Open Review - Editors' Choice
Published
2010-01-11
How to Cite
Kunik, D., Pietrasanta, L. I., & Martínez, O. E. (2010). Surface Percolation and Growth. An alternative scheme for breaking the diffraction limit in optical patterning. Papers in Physics, 1, 010008. https://doi.org/10.4279/pip.010008
Section
Articles